Method and system for polishing pad cleaning

Polishing pad cleaning systems and related methods are disclosed. A rotatable platen comprising a polishing pad in combination with a fluid, such as a polishing fluid, contacts a substrate to planarize material at the surface thereof and resultantly creates debris. A cleaning system introduces a spr...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DIAO, JIE, LI, THOMAS HO FAI, RONDUM, ERIC S, KIM, BUM JICK, LEE, CHRISTOPHER HEUNG-GYUN
Format: Patent
Sprache:chi ; eng
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