Substrate monitoring apparatus and substrate monitoring method

Substrate monitoring apparatus and substrate monitoring method

This substrate monitoring device is provided with: an imaging unit (27) having a prescribed imaging range; an arranging unit (26a) which arranges the substrate (S) within the imaging range; an irradiation unit (29) which irradiates the substrate (Sc(Se1)) arranged in the imaging range with a laser b...

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Hauptverfasser: OHNO, TETSUHIRO, HIGASHI, MOTOTSUGU, SAKAUE, HIROTOSHI
Format: Patent
Sprache:chi ; eng
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INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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HIGASHI, MOTOTSUGU
SAKAUE, HIROTOSHI
description This substrate monitoring device is provided with: an imaging unit (27) having a prescribed imaging range; an arranging unit (26a) which arranges the substrate (S) within the imaging range; an irradiation unit (29) which irradiates the substrate (Sc(Se1)) arranged in the imaging range with a laser beam (L), thereby generating reflected light and/or scattered light reflected or scattered by an edge (So(Se1)) of the substrate, forming an image of the edge (Se1) on a light receiving surface of the imaging unit (27); and a monitoring unit which monitors the imaging result of the imaging unit (27).
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
title Substrate monitoring apparatus and substrate monitoring method
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