Method of fabricating a semiconductor device

Provided are methods of fabricating a semiconductor device including a field effect transistor. Such methods may include sequentially forming lower and intermediate mold layers on a substrate, forming first upper mold patterns and first spacers on the first and second regions, respectively, of the s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM, KYUNGSOO, PARK, YEON HO, SON, NAKJIN, KWON, WOOKHYUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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