Method for verificating patterns for photomask, method for forming photomask, and semiconductor structure

A method for verifying patterns for photomasks includes following steps. A first layout for a first photomask is provided to a computer system, the first layout includes a first device region and a first verification region defined therein, and the first verification region includes a plurality of l...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUANG, YI-PING, SUN, CHIAN, KANG, CHIH-KAI, HSUEH, SHENG-YUAN, SHENG, YIUNG, CHEN, HSIN-HSIEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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