Method for forming a semiconductor device structure

An embodiment method includes forming a patterned etch mask over a target layer and patterning the target layer using the patterned etch mask as a mask to form a patterned target layer. The method further includes performing a first cleaning process on the patterned etch mask and the patterned targe...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHU, CHUN HAN, CHEN, NAI CHIA, HUANG, PING JUNG, SHIH, JUI MING, YEN, BI MING, CHUO, TSUNG MIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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