METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM

METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM

Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric fr...

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Hauptverfasser: DAVIS, TIMOTHY DUGAN, BHATTACHARYYA, KAUSTUVE, BYUN, JINMOO, NOOT, MARC JOHANNES, KIM, HYUN-SU, MATHIJSSEN, SIMON GIJSBERT JOSEPHUS, JANG, WON-JAE
Format: Patent
Sprache:chi ; eng
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APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator DAVIS, TIMOTHY DUGAN
BHATTACHARYYA, KAUSTUVE
BYUN, JINMOO
NOOT, MARC JOHANNES
KIM, HYUN-SU
MATHIJSSEN, SIMON GIJSBERT JOSEPHUS
JANG, WON-JAE
description Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric from a plurality of measurement values each relating to a different measurement condition while cancelling or mitigating for the effect of the process effect parameter on the plurality of measurement values and a second quality metric value for the quality metric from at least one measurement value relating to at least one measurement condition without cancelling or mitigating for the effect of the process effect parameter on the at least one measurement value. The process effect parameter value for the process effect parameter can then be calculated from the first quality metric value and the second quality metric value, for example by calculating their difference.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
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