Wafer processing system with chuck assembly maintenance module
A wafer processing system has a ring maintenance module for loading wafers into a chuck assembly, and for cleaning and inspecting the chuck assembly used in electroplating processors of the system. A shaft is attached to a rotor plate. A rotation motor rotates the shaft and a rotor plate on the shaf...
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creator | HARRIS, RANDY A FRANCISCHETTI, VINCENT STEFFAN SUNDAR, SATISH PUCH, BRYAN RYE, JASON SILVETTI, MARIO DAVID |
description | A wafer processing system has a ring maintenance module for loading wafers into a chuck assembly, and for cleaning and inspecting the chuck assembly used in electroplating processors of the system. A shaft is attached to a rotor plate. A rotation motor rotates the shaft and a rotor plate on the shaft. A chuck clamp on an upper end of the shaft holds the chuck assembly onto the rotor plate. A lift motor raises and lowers the rotor plate and the shaft, to move open the chuck assembly for wafer loading and unloading, and to move the chuck assembly into different process positions. A swing arm having spray nozzles may be provided for cleaning the chuck assembly. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI663684BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI663684BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI663684BB3</originalsourceid><addsrcrecordid>eNrjZLALT0xLLVIoKMpPTi0uzsxLVyiuLC5JzVUozyzJUEjOKE3OVkgsLk7NTcqpVMhNzMwrSc1LzEtOVcjNTynNSeVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfEh4Z5mZsZmFiZOTsZEKAEARbQxOw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Wafer processing system with chuck assembly maintenance module</title><source>esp@cenet</source><creator>HARRIS, RANDY A ; FRANCISCHETTI, VINCENT STEFFAN ; SUNDAR, SATISH ; PUCH, BRYAN ; RYE, JASON ; SILVETTI, MARIO DAVID</creator><creatorcontrib>HARRIS, RANDY A ; FRANCISCHETTI, VINCENT STEFFAN ; SUNDAR, SATISH ; PUCH, BRYAN ; RYE, JASON ; SILVETTI, MARIO DAVID</creatorcontrib><description>A wafer processing system has a ring maintenance module for loading wafers into a chuck assembly, and for cleaning and inspecting the chuck assembly used in electroplating processors of the system. A shaft is attached to a rotor plate. A rotation motor rotates the shaft and a rotor plate on the shaft. A chuck clamp on an upper end of the shaft holds the chuck assembly onto the rotor plate. A lift motor raises and lowers the rotor plate and the shaft, to move open the chuck assembly for wafer loading and unloading, and to move the chuck assembly into different process positions. A swing arm having spray nozzles may be provided for cleaning the chuck assembly.</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190621&DB=EPODOC&CC=TW&NR=I663684B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190621&DB=EPODOC&CC=TW&NR=I663684B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HARRIS, RANDY A</creatorcontrib><creatorcontrib>FRANCISCHETTI, VINCENT STEFFAN</creatorcontrib><creatorcontrib>SUNDAR, SATISH</creatorcontrib><creatorcontrib>PUCH, BRYAN</creatorcontrib><creatorcontrib>RYE, JASON</creatorcontrib><creatorcontrib>SILVETTI, MARIO DAVID</creatorcontrib><title>Wafer processing system with chuck assembly maintenance module</title><description>A wafer processing system has a ring maintenance module for loading wafers into a chuck assembly, and for cleaning and inspecting the chuck assembly used in electroplating processors of the system. A shaft is attached to a rotor plate. A rotation motor rotates the shaft and a rotor plate on the shaft. A chuck clamp on an upper end of the shaft holds the chuck assembly onto the rotor plate. A lift motor raises and lowers the rotor plate and the shaft, to move open the chuck assembly for wafer loading and unloading, and to move the chuck assembly into different process positions. A swing arm having spray nozzles may be provided for cleaning the chuck assembly.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLALT0xLLVIoKMpPTi0uzsxLVyiuLC5JzVUozyzJUEjOKE3OVkgsLk7NTcqpVMhNzMwrSc1LzEtOVcjNTynNSeVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfEh4Z5mZsZmFiZOTsZEKAEARbQxOw</recordid><startdate>20190621</startdate><enddate>20190621</enddate><creator>HARRIS, RANDY A</creator><creator>FRANCISCHETTI, VINCENT STEFFAN</creator><creator>SUNDAR, SATISH</creator><creator>PUCH, BRYAN</creator><creator>RYE, JASON</creator><creator>SILVETTI, MARIO DAVID</creator><scope>EVB</scope></search><sort><creationdate>20190621</creationdate><title>Wafer processing system with chuck assembly maintenance module</title><author>HARRIS, RANDY A ; FRANCISCHETTI, VINCENT STEFFAN ; SUNDAR, SATISH ; PUCH, BRYAN ; RYE, JASON ; SILVETTI, MARIO DAVID</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI663684BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HARRIS, RANDY A</creatorcontrib><creatorcontrib>FRANCISCHETTI, VINCENT STEFFAN</creatorcontrib><creatorcontrib>SUNDAR, SATISH</creatorcontrib><creatorcontrib>PUCH, BRYAN</creatorcontrib><creatorcontrib>RYE, JASON</creatorcontrib><creatorcontrib>SILVETTI, MARIO DAVID</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HARRIS, RANDY A</au><au>FRANCISCHETTI, VINCENT STEFFAN</au><au>SUNDAR, SATISH</au><au>PUCH, BRYAN</au><au>RYE, JASON</au><au>SILVETTI, MARIO DAVID</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Wafer processing system with chuck assembly maintenance module</title><date>2019-06-21</date><risdate>2019</risdate><abstract>A wafer processing system has a ring maintenance module for loading wafers into a chuck assembly, and for cleaning and inspecting the chuck assembly used in electroplating processors of the system. A shaft is attached to a rotor plate. A rotation motor rotates the shaft and a rotor plate on the shaft. A chuck clamp on an upper end of the shaft holds the chuck assembly onto the rotor plate. A lift motor raises and lowers the rotor plate and the shaft, to move open the chuck assembly for wafer loading and unloading, and to move the chuck assembly into different process positions. A swing arm having spray nozzles may be provided for cleaning the chuck assembly.</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | Wafer processing system with chuck assembly maintenance module |
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