Euv lithography system and operating method therefor

An EUV lithography system (1) includes: at least one optical element (13, 14) having an optical surface (13a, 14a) arranged in a vacuum environment (17) of the EUV lithography system (1), and a feed device (27) for feeding hydrogen into the vacuum environment (17), in which at least one silicon-cont...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OSORIO, EDGAR, SCHMIDT, STEFAN-WOLFGANG, TE SLIGTE, EDWIN, LOGTENBERG, HELLA, ZELLENRATH, MARK, EHM, DIRK HEINRICH
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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