Lithographic apparatus, method of transferring a substrate and device manufacturing method

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposu...

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Hauptverfasser:	VAN BEUZEKOM, AART ADRIANUS, OLIESLAGERS, RUUD, PIETERSE, GERBEN, ALBERTI, JOZEF AUGUSTINUS MARIA, WILLEMS, BAS, VAN DER HAM, RONALD, ROPS, CORNELIUS MARIA, FAHRNI, FRANCIS, VAN DEN EIJNDEN, PEPIJN, VAN DONGEN, PAUL, SEGERS, HUBERT MARIE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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