Thermal processing apparatus and thermal processing method

An upper plate on which a substrate is placed is cooled or heated by a thermal processor. The temperature of the thermal processor is adjusted by a temperature adjuster. The temperature of the upper plate is detected. A control value that is to be applied to the temperature adjuster in order to main...

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Bibliographische Detailangaben
Hauptverfasser: GOTO, SHIGEHIRO, FUKUMOTO, YASUHIRO, NISHI, KOJI, MOMMA, TORU, JO, KENICHIRO, TANAKA, ATSUSHI
Format: Patent
Sprache:chi ; eng
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