Method for adapting a design for a patterning device
A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design...
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| creator | WERKMAN, ROY PRENTICE, CHRISTOPHER STAALS, FRANK JOSEN, MARINUS BELTMAN, JOHANNES MARCUS MARIA WILDENBERG, JO SEBASTIAAN TEL, WIM TJIBBO MOS, EVERHARDUS CORNELIS DEPRE, LAURENT MICHEL MARCEL |
| description | A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field. |
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In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180301&DB=EPODOC&CC=TW&NR=I616716B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180301&DB=EPODOC&CC=TW&NR=I616716B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WERKMAN, ROY</creatorcontrib><creatorcontrib>PRENTICE, CHRISTOPHER</creatorcontrib><creatorcontrib>STAALS, FRANK</creatorcontrib><creatorcontrib>JOSEN, MARINUS</creatorcontrib><creatorcontrib>BELTMAN, JOHANNES MARCUS MARIA</creatorcontrib><creatorcontrib>WILDENBERG, JO SEBASTIAAN</creatorcontrib><creatorcontrib>TEL, WIM TJIBBO</creatorcontrib><creatorcontrib>MOS, EVERHARDUS CORNELIS</creatorcontrib><creatorcontrib>DEPRE, LAURENT MICHEL MARCEL</creatorcontrib><title>Method for adapting a design for a patterning device</title><description>A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDxTS3JyE9RSMsvUkhMSSwoycxLV0hUSEktzkzPg4gqFCSWlKQW5YFkUlLLMpNTeRhY0xJzilN5oTQ3g4Kba4izh25qQX58anFBYnJqXmpJfEi4p5mhmbmhmZOTMRFKAKYyLFo</recordid><startdate>20180301</startdate><enddate>20180301</enddate><creator>WERKMAN, ROY</creator><creator>PRENTICE, CHRISTOPHER</creator><creator>STAALS, FRANK</creator><creator>JOSEN, MARINUS</creator><creator>BELTMAN, JOHANNES MARCUS MARIA</creator><creator>WILDENBERG, JO SEBASTIAAN</creator><creator>TEL, WIM TJIBBO</creator><creator>MOS, EVERHARDUS CORNELIS</creator><creator>DEPRE, LAURENT MICHEL MARCEL</creator><scope>EVB</scope></search><sort><creationdate>20180301</creationdate><title>Method for adapting a design for a patterning device</title><author>WERKMAN, ROY ; PRENTICE, CHRISTOPHER ; STAALS, FRANK ; JOSEN, MARINUS ; BELTMAN, JOHANNES MARCUS MARIA ; WILDENBERG, JO SEBASTIAAN ; TEL, WIM TJIBBO ; MOS, EVERHARDUS CORNELIS ; DEPRE, LAURENT MICHEL MARCEL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI616716BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>WERKMAN, ROY</creatorcontrib><creatorcontrib>PRENTICE, CHRISTOPHER</creatorcontrib><creatorcontrib>STAALS, FRANK</creatorcontrib><creatorcontrib>JOSEN, MARINUS</creatorcontrib><creatorcontrib>BELTMAN, JOHANNES MARCUS MARIA</creatorcontrib><creatorcontrib>WILDENBERG, JO SEBASTIAAN</creatorcontrib><creatorcontrib>TEL, WIM TJIBBO</creatorcontrib><creatorcontrib>MOS, EVERHARDUS CORNELIS</creatorcontrib><creatorcontrib>DEPRE, LAURENT MICHEL MARCEL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WERKMAN, ROY</au><au>PRENTICE, CHRISTOPHER</au><au>STAALS, FRANK</au><au>JOSEN, MARINUS</au><au>BELTMAN, JOHANNES MARCUS MARIA</au><au>WILDENBERG, JO SEBASTIAAN</au><au>TEL, WIM TJIBBO</au><au>MOS, EVERHARDUS CORNELIS</au><au>DEPRE, LAURENT MICHEL MARCEL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for adapting a design for a patterning device</title><date>2018-03-01</date><risdate>2018</risdate><abstract>A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Method for adapting a design for a patterning device |
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