Substrate processing apparatus, jig and teaching method

The purposes of the present invention are: to reduce the amount of teaching-related work performed by workers; and to achieve more accurate teaching. In a jig (70), an imaging unit (71) and a scale face (72A) are disposed facing each other. Furthermore, the jig (70) is attached to a spin base (6), a...

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Bibliographische Detailangaben
Hauptverfasser:	UEMAE, SHOJI, TSURUMI, RYOHEI, HIRATA, TETSUYA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY NOZZLES PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	The purposes of the present invention are: to reduce the amount of teaching-related work performed by workers; and to achieve more accurate teaching. In a jig (70), an imaging unit (71) and a scale face (72A) are disposed facing each other. Furthermore, the jig (70) is attached to a spin base (6), and imaging is performed by the imaging unit (71) while a discharge unit (31) is in a state of having been positioned with respect to the scale face (72A) in the jig (70). Accordingly, positional information related to the discharge unit (31) and observed from the spin base (6) can be acquired on the basis of the imaging results.