Lithographic apparatus, method of transferring a substrate and device manufacturing method
A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposu...
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| creator | VAN BEUZEKOM, AART ADRIANUS OLIESLAGERS, RUUD PIETERSE, GERBEN ALBERTI, JOZEF AUGUSTINUS MARIA WILLEMS, BAS VAN DER HAM, RONALD ROPS, CORNELIUS MARIA FAHRNI, FRANCIS VAN DEN EIJNDEN, PEPIJN VAN DONGEN, PAUL SEGERS, HUBERT MARIE |
| description | A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler. |
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The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170601&DB=EPODOC&CC=TW&NR=I585545B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170601&DB=EPODOC&CC=TW&NR=I585545B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN BEUZEKOM, AART ADRIANUS</creatorcontrib><creatorcontrib>OLIESLAGERS, RUUD</creatorcontrib><creatorcontrib>PIETERSE, GERBEN</creatorcontrib><creatorcontrib>ALBERTI, JOZEF AUGUSTINUS MARIA</creatorcontrib><creatorcontrib>WILLEMS, BAS</creatorcontrib><creatorcontrib>VAN DER HAM, RONALD</creatorcontrib><creatorcontrib>ROPS, CORNELIUS MARIA</creatorcontrib><creatorcontrib>FAHRNI, FRANCIS</creatorcontrib><creatorcontrib>VAN DEN EIJNDEN, PEPIJN</creatorcontrib><creatorcontrib>VAN DONGEN, PAUL</creatorcontrib><creatorcontrib>SEGERS, HUBERT MARIE</creatorcontrib><title>Lithographic apparatus, method of transferring a substrate and device manufacturing method</title><description>A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. 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The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Lithographic apparatus, method of transferring a substrate and device manufacturing method |
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