Calibration apparatus and adjustment method for adjusting illumination device of lithography apparatus
A calibration apparatus is provided. The calibration apparatus includes a wafer carrier configured to support a substrate with a patterned layer. The patterned layer includes a first exposure area and remaining exposure areas, and each of the first and the remaining exposure areas includes a first c...
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| creator | HUNG, AI JEN LU, SHIN RUNG TSEN, YEN DI HUANG, CHEN YEN |
| description | A calibration apparatus is provided. The calibration apparatus includes a wafer carrier configured to support a substrate with a patterned layer. The patterned layer includes a first exposure area and remaining exposure areas, and each of the first and the remaining exposure areas includes a first checking mark. The calibration apparatus also includes a measurement device configured to obtain a first exposure value of the first checking mark of the first exposure area by measuring the first checking mark of the first exposure area. The calibration apparatus also includes a processing module configured to calculate first calculated values of the first checking marks of the remaining exposure areas according to the first exposure value and a standard file. The illumination device is adjusted by an adjustment device of the lithography apparatus according to the first calculated values during a lithography process. |
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The calibration apparatus includes a wafer carrier configured to support a substrate with a patterned layer. The patterned layer includes a first exposure area and remaining exposure areas, and each of the first and the remaining exposure areas includes a first checking mark. The calibration apparatus also includes a measurement device configured to obtain a first exposure value of the first checking mark of the first exposure area by measuring the first checking mark of the first exposure area. The calibration apparatus also includes a processing module configured to calculate first calculated values of the first checking marks of the remaining exposure areas according to the first exposure value and a standard file. 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The illumination device is adjusted by an adjustment device of the lithography apparatus according to the first calculated values during a lithography process.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjL0KwkAQhK-xEPUd9gVs1KB1gqJ9wDKsub1k5W7vuB_BtzdgwNZqPoZvZqlMg5YfETN7AQwBJywJUDSgfpaUHUkGR3n0GoyPc8syAFtbHMt3qunFPYE3YHlyh4hhfP8O12ph0CbazLlScDm3zXVLwXeUAvYklLv2fqtOu-pwrOv9H8oHmkxA5w</recordid><startdate>20170511</startdate><enddate>20170511</enddate><creator>HUNG, AI JEN</creator><creator>LU, SHIN RUNG</creator><creator>TSEN, YEN DI</creator><creator>HUANG, CHEN YEN</creator><scope>EVB</scope></search><sort><creationdate>20170511</creationdate><title>Calibration apparatus and adjustment method for adjusting illumination device of lithography apparatus</title><author>HUNG, AI JEN ; LU, SHIN RUNG ; TSEN, YEN DI ; HUANG, CHEN YEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI582547BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HUNG, AI JEN</creatorcontrib><creatorcontrib>LU, SHIN RUNG</creatorcontrib><creatorcontrib>TSEN, YEN DI</creatorcontrib><creatorcontrib>HUANG, CHEN YEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HUNG, AI JEN</au><au>LU, SHIN RUNG</au><au>TSEN, YEN DI</au><au>HUANG, CHEN YEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Calibration apparatus and adjustment method for adjusting illumination device of lithography apparatus</title><date>2017-05-11</date><risdate>2017</risdate><abstract>A calibration apparatus is provided. The calibration apparatus includes a wafer carrier configured to support a substrate with a patterned layer. The patterned layer includes a first exposure area and remaining exposure areas, and each of the first and the remaining exposure areas includes a first checking mark. The calibration apparatus also includes a measurement device configured to obtain a first exposure value of the first checking mark of the first exposure area by measuring the first checking mark of the first exposure area. The calibration apparatus also includes a processing module configured to calculate first calculated values of the first checking marks of the remaining exposure areas according to the first exposure value and a standard file. The illumination device is adjusted by an adjustment device of the lithography apparatus according to the first calculated values during a lithography process.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Calibration apparatus and adjustment method for adjusting illumination device of lithography apparatus |
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