Method of protecting patterned magnetic materials

The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim int...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: XU, YUAN, FAN, ZHAOHUI, KUO, DAVID SHIAO-MIN, WAGO, KOICHI, HWU, JUSTIN JIA JEN
Format: Patent
Sprache:chi ; eng
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