Deposition mask, deposition apparatus, and method for forming thin film

To provide a vapor deposition mask, a vapor deposition device and a vapor deposition method, capable of being applied to a large-sized substrate. Openings 11 are formed on the vapor deposition mask 10 so that distances between their centers may become two times the distance between pixels 51a1, 51a2...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FUKAO, MASATO, HANE, KOUJI, ITOU, MASAHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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