Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes

Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may incl...

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Bibliographische Detailangaben
Hauptverfasser: FIERRO, LOUIS, GETTY, JAMES D, BOLDEN, THOMAS V. II
Format: Patent
Sprache:chi ; eng
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