Illumination optical unit for euv microlithography

The invention relates to an illumination optical unit for EUV microlithography comprising a first optical element (1) having a plurality of first reflective facet elements (3) and a second optical element (5) having a plurality of second reflective facet elements (7). In this case, each first reflec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BIELING, STIG, DOERN, SEBASTIAN, ENDRES, MARTIN, KIRCH, MARC
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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