Lithographic apparatus and method of cooling a component in a lithographic apparatus

A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the c...

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Hauptverfasser: VAN DEN HEUVEL, LEONARDA HENDRIKA, VAN DER NET, ANTONIUS JOHANNUS, VAN BOXTEL, FRANK JOHANNES JACOBUS
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creator VAN DEN HEUVEL, LEONARDA HENDRIKA
VAN DER NET, ANTONIUS JOHANNUS
VAN BOXTEL, FRANK JOHANNES JACOBUS
description A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.
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language chi ; eng
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Lithographic apparatus and method of cooling a component in a lithographic apparatus
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