Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes
Methods for depositing films using hot wire chemical vapor deposition (HWCVD) processes are provided herein. In some embodiments, a method of operating an HWCVD tool may include providing hydrogen gas (H2) to a filament disposed in a process chamber of the HWCVD tool for a first period of time; and...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | THAKUR, BIPIN PATIL, RAVINDRA JANU KELLER, STEFAN CRUZ, JOE GRIFFITH GUJAR, VIKAS |
| description | Methods for depositing films using hot wire chemical vapor deposition (HWCVD) processes are provided herein. In some embodiments, a method of operating an HWCVD tool may include providing hydrogen gas (H2) to a filament disposed in a process chamber of the HWCVD tool for a first period of time; and flowing current through the filament to raise the temperature of the filament to a first temperature after the first period of time. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI488992BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI488992BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI488992BB3</originalsourceid><addsrcrecordid>eNqNyzEOwjAMQNEuDAi4gy_AAgztWgSCga0SC1JlpQ6xlDhRbOD6dOAATH95f9k8bmQhTwo-VyAJKI7lCYZiGF8JPEdMJAaRPQELhGzw4UrgAiV2GOGNZX4nKlnZOAuUmh2pkq6bhceotPl11cD5NBwv29mOpAUdCdk43K-Htu26Xd_v_yBfbGI8ZQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes</title><source>esp@cenet</source><creator>THAKUR, BIPIN ; PATIL, RAVINDRA JANU ; KELLER, STEFAN ; CRUZ, JOE GRIFFITH ; GUJAR, VIKAS</creator><creatorcontrib>THAKUR, BIPIN ; PATIL, RAVINDRA JANU ; KELLER, STEFAN ; CRUZ, JOE GRIFFITH ; GUJAR, VIKAS</creatorcontrib><description>Methods for depositing films using hot wire chemical vapor deposition (HWCVD) processes are provided herein. In some embodiments, a method of operating an HWCVD tool may include providing hydrogen gas (H2) to a filament disposed in a process chamber of the HWCVD tool for a first period of time; and flowing current through the filament to raise the temperature of the filament to a first temperature after the first period of time.</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150621&DB=EPODOC&CC=TW&NR=I488992B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150621&DB=EPODOC&CC=TW&NR=I488992B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>THAKUR, BIPIN</creatorcontrib><creatorcontrib>PATIL, RAVINDRA JANU</creatorcontrib><creatorcontrib>KELLER, STEFAN</creatorcontrib><creatorcontrib>CRUZ, JOE GRIFFITH</creatorcontrib><creatorcontrib>GUJAR, VIKAS</creatorcontrib><title>Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes</title><description>Methods for depositing films using hot wire chemical vapor deposition (HWCVD) processes are provided herein. In some embodiments, a method of operating an HWCVD tool may include providing hydrogen gas (H2) to a filament disposed in a process chamber of the HWCVD tool for a first period of time; and flowing current through the filament to raise the temperature of the filament to a first temperature after the first period of time.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyzEOwjAMQNEuDAi4gy_AAgztWgSCga0SC1JlpQ6xlDhRbOD6dOAATH95f9k8bmQhTwo-VyAJKI7lCYZiGF8JPEdMJAaRPQELhGzw4UrgAiV2GOGNZX4nKlnZOAuUmh2pkq6bhceotPl11cD5NBwv29mOpAUdCdk43K-Htu26Xd_v_yBfbGI8ZQ</recordid><startdate>20150621</startdate><enddate>20150621</enddate><creator>THAKUR, BIPIN</creator><creator>PATIL, RAVINDRA JANU</creator><creator>KELLER, STEFAN</creator><creator>CRUZ, JOE GRIFFITH</creator><creator>GUJAR, VIKAS</creator><scope>EVB</scope></search><sort><creationdate>20150621</creationdate><title>Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes</title><author>THAKUR, BIPIN ; PATIL, RAVINDRA JANU ; KELLER, STEFAN ; CRUZ, JOE GRIFFITH ; GUJAR, VIKAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI488992BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2015</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>THAKUR, BIPIN</creatorcontrib><creatorcontrib>PATIL, RAVINDRA JANU</creatorcontrib><creatorcontrib>KELLER, STEFAN</creatorcontrib><creatorcontrib>CRUZ, JOE GRIFFITH</creatorcontrib><creatorcontrib>GUJAR, VIKAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>THAKUR, BIPIN</au><au>PATIL, RAVINDRA JANU</au><au>KELLER, STEFAN</au><au>CRUZ, JOE GRIFFITH</au><au>GUJAR, VIKAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes</title><date>2015-06-21</date><risdate>2015</risdate><abstract>Methods for depositing films using hot wire chemical vapor deposition (HWCVD) processes are provided herein. In some embodiments, a method of operating an HWCVD tool may include providing hydrogen gas (H2) to a filament disposed in a process chamber of the HWCVD tool for a first period of time; and flowing current through the filament to raise the temperature of the filament to a first temperature after the first period of time.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TWI488992BB |
| source | esp@cenet |
| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T18%3A35%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=THAKUR,%20BIPIN&rft.date=2015-06-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI488992BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |