Semiconductor device and manufacturing method thereof

A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a gate, a channel layer, a gate insulation layer, a source, a drain and a silicon-aluminum-oxide layer. The gate is disposed on a substrate. The channel layer is disposed on the substrate. The c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIN, CHUN NAN, WU, SHU FENG, KAO, YIH CHYUN, TU, CHEN YUAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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