A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | VAN DEN HEUVEL, LEONARDA HENDRIKA MARTENS, ARJAN HUBRECHT JOSEF ANNA VAN BOXTEL, FRANK JOHANNES JACOBUS |
description | |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI461860BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI461860BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI461860BB3</originalsourceid><addsrcrecordid>eNqNi7sKwkAQANNYiPoP-wEKihJsjSjaByzDercmC7m75R6SVP66VwhpraaYmXnxOYEkIxDGEMmsAUGhfzoLmt3AmiAkkX6cvAUaokcVOUfT1XPsXOtROlaAIugxppBznaWmNysCgza98pk82xYM5UMvi9kL-0CrHxcFXC_1-bYhcQ0FQUWWYlM_7odydyy3VbX_I_kCLF1I2g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method</title><source>esp@cenet</source><creator>VAN DEN HEUVEL, LEONARDA HENDRIKA ; MARTENS, ARJAN HUBRECHT JOSEF ANNA ; VAN BOXTEL, FRANK JOHANNES JACOBUS</creator><creatorcontrib>VAN DEN HEUVEL, LEONARDA HENDRIKA ; MARTENS, ARJAN HUBRECHT JOSEF ANNA ; VAN BOXTEL, FRANK JOHANNES JACOBUS</creatorcontrib><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ; TECHNICAL SUBJECTS COVERED BY FORMER USPC ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141121&DB=EPODOC&CC=TW&NR=I461860B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141121&DB=EPODOC&CC=TW&NR=I461860B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DEN HEUVEL, LEONARDA HENDRIKA</creatorcontrib><creatorcontrib>MARTENS, ARJAN HUBRECHT JOSEF ANNA</creatorcontrib><creatorcontrib>VAN BOXTEL, FRANK JOHANNES JACOBUS</creatorcontrib><title>A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7sKwkAQANNYiPoP-wEKihJsjSjaByzDercmC7m75R6SVP66VwhpraaYmXnxOYEkIxDGEMmsAUGhfzoLmt3AmiAkkX6cvAUaokcVOUfT1XPsXOtROlaAIugxppBznaWmNysCgza98pk82xYM5UMvi9kL-0CrHxcFXC_1-bYhcQ0FQUWWYlM_7odydyy3VbX_I_kCLF1I2g</recordid><startdate>20141121</startdate><enddate>20141121</enddate><creator>VAN DEN HEUVEL, LEONARDA HENDRIKA</creator><creator>MARTENS, ARJAN HUBRECHT JOSEF ANNA</creator><creator>VAN BOXTEL, FRANK JOHANNES JACOBUS</creator><scope>EVB</scope></search><sort><creationdate>20141121</creationdate><title>A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method</title><author>VAN DEN HEUVEL, LEONARDA HENDRIKA ; MARTENS, ARJAN HUBRECHT JOSEF ANNA ; VAN BOXTEL, FRANK JOHANNES JACOBUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI461860BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DEN HEUVEL, LEONARDA HENDRIKA</creatorcontrib><creatorcontrib>MARTENS, ARJAN HUBRECHT JOSEF ANNA</creatorcontrib><creatorcontrib>VAN BOXTEL, FRANK JOHANNES JACOBUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DEN HEUVEL, LEONARDA HENDRIKA</au><au>MARTENS, ARJAN HUBRECHT JOSEF ANNA</au><au>VAN BOXTEL, FRANK JOHANNES JACOBUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method</title><date>2014-11-21</date><risdate>2014</risdate><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_TWI461860BB |
source | esp@cenet |
subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS |
title | A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-30T23%3A59%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=VAN%20DEN%20HEUVEL,%20LEONARDA%20HENDRIKA&rft.date=2014-11-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI461860BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |