container_end_page
container_issue
container_start_page
container_title
container_volume
creator VAN DEN HEUVEL, LEONARDA HENDRIKA
MARTENS, ARJAN HUBRECHT JOSEF ANNA
VAN BOXTEL, FRANK JOHANNES JACOBUS
description
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI461860BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI461860BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI461860BB3</originalsourceid><addsrcrecordid>eNqNi7sKwkAQANNYiPoP-wEKihJsjSjaByzDercmC7m75R6SVP66VwhpraaYmXnxOYEkIxDGEMmsAUGhfzoLmt3AmiAkkX6cvAUaokcVOUfT1XPsXOtROlaAIugxppBznaWmNysCgza98pk82xYM5UMvi9kL-0CrHxcFXC_1-bYhcQ0FQUWWYlM_7odydyy3VbX_I_kCLF1I2g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method</title><source>esp@cenet</source><creator>VAN DEN HEUVEL, LEONARDA HENDRIKA ; MARTENS, ARJAN HUBRECHT JOSEF ANNA ; VAN BOXTEL, FRANK JOHANNES JACOBUS</creator><creatorcontrib>VAN DEN HEUVEL, LEONARDA HENDRIKA ; MARTENS, ARJAN HUBRECHT JOSEF ANNA ; VAN BOXTEL, FRANK JOHANNES JACOBUS</creatorcontrib><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ; TECHNICAL SUBJECTS COVERED BY FORMER USPC ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20141121&amp;DB=EPODOC&amp;CC=TW&amp;NR=I461860B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20141121&amp;DB=EPODOC&amp;CC=TW&amp;NR=I461860B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DEN HEUVEL, LEONARDA HENDRIKA</creatorcontrib><creatorcontrib>MARTENS, ARJAN HUBRECHT JOSEF ANNA</creatorcontrib><creatorcontrib>VAN BOXTEL, FRANK JOHANNES JACOBUS</creatorcontrib><title>A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7sKwkAQANNYiPoP-wEKihJsjSjaByzDercmC7m75R6SVP66VwhpraaYmXnxOYEkIxDGEMmsAUGhfzoLmt3AmiAkkX6cvAUaokcVOUfT1XPsXOtROlaAIugxppBznaWmNysCgza98pk82xYM5UMvi9kL-0CrHxcFXC_1-bYhcQ0FQUWWYlM_7odydyy3VbX_I_kCLF1I2g</recordid><startdate>20141121</startdate><enddate>20141121</enddate><creator>VAN DEN HEUVEL, LEONARDA HENDRIKA</creator><creator>MARTENS, ARJAN HUBRECHT JOSEF ANNA</creator><creator>VAN BOXTEL, FRANK JOHANNES JACOBUS</creator><scope>EVB</scope></search><sort><creationdate>20141121</creationdate><title>A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method</title><author>VAN DEN HEUVEL, LEONARDA HENDRIKA ; MARTENS, ARJAN HUBRECHT JOSEF ANNA ; VAN BOXTEL, FRANK JOHANNES JACOBUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI461860BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DEN HEUVEL, LEONARDA HENDRIKA</creatorcontrib><creatorcontrib>MARTENS, ARJAN HUBRECHT JOSEF ANNA</creatorcontrib><creatorcontrib>VAN BOXTEL, FRANK JOHANNES JACOBUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DEN HEUVEL, LEONARDA HENDRIKA</au><au>MARTENS, ARJAN HUBRECHT JOSEF ANNA</au><au>VAN BOXTEL, FRANK JOHANNES JACOBUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method</title><date>2014-11-21</date><risdate>2014</risdate><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_TWI461860BB
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
TECHNICAL SUBJECTS COVERED BY FORMER USPC
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
title A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-30T23%3A59%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=VAN%20DEN%20HEUVEL,%20LEONARDA%20HENDRIKA&rft.date=2014-11-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI461860BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true