Leaf spring, stage system, and lithographic apparatus
A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting locat...
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| creator | RIEDSTRA, BART FRISO HOOGENDAM, CHRISTIAAN ALEXANDER CUIJPERS, MARTINUS AGNES WILLEM BRUIN, MAIKEL CORNELIS ANDREAS GIJZEN, RONALD CORNELIS GERARDUS |
| description | A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions. |
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GIJZEN, RONALD CORNELIS GERARDUS</creatorcontrib><description>A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; BLASTING ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; ENGINEERING ELEMENTS AND UNITS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; HEATING ; HOLOGRAPHY ; LIGHTING ; MATERIALS THEREFOR ; MEANS FOR DAMPING VIBRATION ; MECHANICAL ENGINEERING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; SHOCK-ABSORBERS ; SPRINGS ; THERMAL INSULATION IN GENERAL ; WEAPONS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140821&DB=EPODOC&CC=TW&NR=I449852B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140821&DB=EPODOC&CC=TW&NR=I449852B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RIEDSTRA, BART FRISO</creatorcontrib><creatorcontrib>HOOGENDAM, CHRISTIAAN ALEXANDER</creatorcontrib><creatorcontrib>CUIJPERS, MARTINUS AGNES WILLEM</creatorcontrib><creatorcontrib>BRUIN, MAIKEL CORNELIS ANDREAS</creatorcontrib><creatorcontrib>GIJZEN, RONALD CORNELIS GERARDUS</creatorcontrib><title>Leaf spring, stage system, and lithographic apparatus</title><description>A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>HEATING</subject><subject>HOLOGRAPHY</subject><subject>LIGHTING</subject><subject>MATERIALS THEREFOR</subject><subject>MEANS FOR DAMPING VIBRATION</subject><subject>MECHANICAL ENGINEERING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SHOCK-ABSORBERS</subject><subject>SPRINGS</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD1SU1MUyguKMrMS9dRKC5JTE9VKK4sLknN1VFIzEtRyMksychPL0osyMhMVkgsKEgsSiwpLeZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfEh4Z4mJpYWpkZOTsZEKAEA_PktJA</recordid><startdate>20140821</startdate><enddate>20140821</enddate><creator>RIEDSTRA, BART FRISO</creator><creator>HOOGENDAM, CHRISTIAAN ALEXANDER</creator><creator>CUIJPERS, MARTINUS AGNES WILLEM</creator><creator>BRUIN, MAIKEL CORNELIS ANDREAS</creator><creator>GIJZEN, RONALD CORNELIS GERARDUS</creator><scope>EVB</scope></search><sort><creationdate>20140821</creationdate><title>Leaf spring, stage system, and lithographic apparatus</title><author>RIEDSTRA, BART FRISO ; HOOGENDAM, CHRISTIAAN ALEXANDER ; CUIJPERS, MARTINUS AGNES WILLEM ; BRUIN, MAIKEL CORNELIS ANDREAS ; GIJZEN, RONALD CORNELIS GERARDUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI449852BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>HEATING</topic><topic>HOLOGRAPHY</topic><topic>LIGHTING</topic><topic>MATERIALS THEREFOR</topic><topic>MEANS FOR DAMPING VIBRATION</topic><topic>MECHANICAL ENGINEERING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SHOCK-ABSORBERS</topic><topic>SPRINGS</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>RIEDSTRA, BART FRISO</creatorcontrib><creatorcontrib>HOOGENDAM, CHRISTIAAN ALEXANDER</creatorcontrib><creatorcontrib>CUIJPERS, MARTINUS AGNES WILLEM</creatorcontrib><creatorcontrib>BRUIN, MAIKEL CORNELIS ANDREAS</creatorcontrib><creatorcontrib>GIJZEN, RONALD CORNELIS GERARDUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RIEDSTRA, BART FRISO</au><au>HOOGENDAM, CHRISTIAAN ALEXANDER</au><au>CUIJPERS, MARTINUS AGNES WILLEM</au><au>BRUIN, MAIKEL CORNELIS ANDREAS</au><au>GIJZEN, RONALD CORNELIS GERARDUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Leaf spring, stage system, and lithographic apparatus</title><date>2014-08-21</date><risdate>2014</risdate><abstract>A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS BLASTING CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING HOLOGRAPHY LIGHTING MATERIALS THEREFOR MEANS FOR DAMPING VIBRATION MECHANICAL ENGINEERING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHOCK-ABSORBERS SPRINGS THERMAL INSULATION IN GENERAL WEAPONS |
| title | Leaf spring, stage system, and lithographic apparatus |
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