A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
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| creator | RIEPEN, MICHEL SHULEPOV, SERGEI MULKENS, JOHANNES CATHARINUS HUBERTUS MA, ZHENHUA EVANGELISTA, FABRIZIO BESSEMS, DAVID EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA STAVENGA, MARCO KOERT WITBERG, ERIK CROMWIJK, JAN WILLEM KEMPER, NICOLAAS RUDOLF GUNTER, PIETER LEIN JOSEPH BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS JOSEN, MARINUS MEIJERS, RALPH JOSEPH BELL, FRANCISCUS WILHELMUS LEENDERS, MARTINUS HENDRIKUS ANTONIUS LIEBREGTS, PAULUS MARTINUS MARIA MOERMAN, RICHARD SMITS, MARCUS AGNES JOHANNES LI, HUA STEFFENS, KOEN |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI422988BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI422988BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI422988BB3</originalsourceid><addsrcrecordid>eNqNy7EKwjAQxvEsDqK-wz2ALtWhjlYU3QuO5UguTSBNjuTi81tRcHX6hv_vWyo8QfDi0piRndeAzJhRatkCwkRzMZAs6BQlpxB8HEEc_RhgNLM09PSaYMJYLWqp-Q0_97VaWAyFNt9dKbhe-vNtR5wGKoyaIsnQP-6Hpjm2bdft_yAvgsc9vQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method</title><source>esp@cenet</source><creator>RIEPEN, MICHEL ; SHULEPOV, SERGEI ; MULKENS, JOHANNES CATHARINUS HUBERTUS ; MA, ZHENHUA ; EVANGELISTA, FABRIZIO ; BESSEMS, DAVID ; EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA ; STAVENGA, MARCO KOERT ; WITBERG, ERIK ; CROMWIJK, JAN WILLEM ; KEMPER, NICOLAAS RUDOLF ; GUNTER, PIETER LEIN JOSEPH ; BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS ; JOSEN, MARINUS ; MEIJERS, RALPH JOSEPH ; BELL, FRANCISCUS WILHELMUS ; LEENDERS, MARTINUS HENDRIKUS ANTONIUS ; LIEBREGTS, PAULUS MARTINUS MARIA ; MOERMAN, RICHARD ; SMITS, MARCUS AGNES JOHANNES ; LI, HUA ; STEFFENS, KOEN</creator><creatorcontrib>RIEPEN, MICHEL ; SHULEPOV, SERGEI ; MULKENS, JOHANNES CATHARINUS HUBERTUS ; MA, ZHENHUA ; EVANGELISTA, FABRIZIO ; BESSEMS, DAVID ; EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA ; STAVENGA, MARCO KOERT ; WITBERG, ERIK ; CROMWIJK, JAN WILLEM ; KEMPER, NICOLAAS RUDOLF ; GUNTER, PIETER LEIN JOSEPH ; BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS ; JOSEN, MARINUS ; MEIJERS, RALPH JOSEPH ; BELL, FRANCISCUS WILHELMUS ; LEENDERS, MARTINUS HENDRIKUS ANTONIUS ; LIEBREGTS, PAULUS MARTINUS MARIA ; MOERMAN, RICHARD ; SMITS, MARCUS AGNES JOHANNES ; LI, HUA ; STEFFENS, KOEN</creatorcontrib><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140111&DB=EPODOC&CC=TW&NR=I422988B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140111&DB=EPODOC&CC=TW&NR=I422988B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RIEPEN, MICHEL</creatorcontrib><creatorcontrib>SHULEPOV, SERGEI</creatorcontrib><creatorcontrib>MULKENS, JOHANNES CATHARINUS HUBERTUS</creatorcontrib><creatorcontrib>MA, ZHENHUA</creatorcontrib><creatorcontrib>EVANGELISTA, FABRIZIO</creatorcontrib><creatorcontrib>BESSEMS, DAVID</creatorcontrib><creatorcontrib>EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</creatorcontrib><creatorcontrib>STAVENGA, MARCO KOERT</creatorcontrib><creatorcontrib>WITBERG, ERIK</creatorcontrib><creatorcontrib>CROMWIJK, JAN WILLEM</creatorcontrib><creatorcontrib>KEMPER, NICOLAAS RUDOLF</creatorcontrib><creatorcontrib>GUNTER, PIETER LEIN JOSEPH</creatorcontrib><creatorcontrib>BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS</creatorcontrib><creatorcontrib>JOSEN, MARINUS</creatorcontrib><creatorcontrib>MEIJERS, RALPH JOSEPH</creatorcontrib><creatorcontrib>BELL, FRANCISCUS WILHELMUS</creatorcontrib><creatorcontrib>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</creatorcontrib><creatorcontrib>LIEBREGTS, PAULUS MARTINUS MARIA</creatorcontrib><creatorcontrib>MOERMAN, RICHARD</creatorcontrib><creatorcontrib>SMITS, MARCUS AGNES JOHANNES</creatorcontrib><creatorcontrib>LI, HUA</creatorcontrib><creatorcontrib>STEFFENS, KOEN</creatorcontrib><title>A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNy7EKwjAQxvEsDqK-wz2ALtWhjlYU3QuO5UguTSBNjuTi81tRcHX6hv_vWyo8QfDi0piRndeAzJhRatkCwkRzMZAs6BQlpxB8HEEc_RhgNLM09PSaYMJYLWqp-Q0_97VaWAyFNt9dKbhe-vNtR5wGKoyaIsnQP-6Hpjm2bdft_yAvgsc9vQ</recordid><startdate>20140111</startdate><enddate>20140111</enddate><creator>RIEPEN, MICHEL</creator><creator>SHULEPOV, SERGEI</creator><creator>MULKENS, JOHANNES CATHARINUS HUBERTUS</creator><creator>MA, ZHENHUA</creator><creator>EVANGELISTA, FABRIZIO</creator><creator>BESSEMS, DAVID</creator><creator>EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</creator><creator>STAVENGA, MARCO KOERT</creator><creator>WITBERG, ERIK</creator><creator>CROMWIJK, JAN WILLEM</creator><creator>KEMPER, NICOLAAS RUDOLF</creator><creator>GUNTER, PIETER LEIN JOSEPH</creator><creator>BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS</creator><creator>JOSEN, MARINUS</creator><creator>MEIJERS, RALPH JOSEPH</creator><creator>BELL, FRANCISCUS WILHELMUS</creator><creator>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</creator><creator>LIEBREGTS, PAULUS MARTINUS MARIA</creator><creator>MOERMAN, RICHARD</creator><creator>SMITS, MARCUS AGNES JOHANNES</creator><creator>LI, HUA</creator><creator>STEFFENS, KOEN</creator><scope>EVB</scope></search><sort><creationdate>20140111</creationdate><title>A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method</title><author>RIEPEN, MICHEL ; SHULEPOV, SERGEI ; MULKENS, JOHANNES CATHARINUS HUBERTUS ; MA, ZHENHUA ; EVANGELISTA, FABRIZIO ; BESSEMS, DAVID ; EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA ; STAVENGA, MARCO KOERT ; WITBERG, ERIK ; CROMWIJK, JAN WILLEM ; KEMPER, NICOLAAS RUDOLF ; GUNTER, PIETER LEIN JOSEPH ; BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS ; JOSEN, MARINUS ; MEIJERS, RALPH JOSEPH ; BELL, FRANCISCUS WILHELMUS ; LEENDERS, MARTINUS HENDRIKUS ANTONIUS ; LIEBREGTS, PAULUS MARTINUS MARIA ; MOERMAN, RICHARD ; SMITS, MARCUS AGNES JOHANNES ; LI, HUA ; STEFFENS, KOEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI422988BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>RIEPEN, MICHEL</creatorcontrib><creatorcontrib>SHULEPOV, SERGEI</creatorcontrib><creatorcontrib>MULKENS, JOHANNES CATHARINUS HUBERTUS</creatorcontrib><creatorcontrib>MA, ZHENHUA</creatorcontrib><creatorcontrib>EVANGELISTA, FABRIZIO</creatorcontrib><creatorcontrib>BESSEMS, DAVID</creatorcontrib><creatorcontrib>EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</creatorcontrib><creatorcontrib>STAVENGA, MARCO KOERT</creatorcontrib><creatorcontrib>WITBERG, ERIK</creatorcontrib><creatorcontrib>CROMWIJK, JAN WILLEM</creatorcontrib><creatorcontrib>KEMPER, NICOLAAS RUDOLF</creatorcontrib><creatorcontrib>GUNTER, PIETER LEIN JOSEPH</creatorcontrib><creatorcontrib>BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS</creatorcontrib><creatorcontrib>JOSEN, MARINUS</creatorcontrib><creatorcontrib>MEIJERS, RALPH JOSEPH</creatorcontrib><creatorcontrib>BELL, FRANCISCUS WILHELMUS</creatorcontrib><creatorcontrib>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</creatorcontrib><creatorcontrib>LIEBREGTS, PAULUS MARTINUS MARIA</creatorcontrib><creatorcontrib>MOERMAN, RICHARD</creatorcontrib><creatorcontrib>SMITS, MARCUS AGNES JOHANNES</creatorcontrib><creatorcontrib>LI, HUA</creatorcontrib><creatorcontrib>STEFFENS, KOEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RIEPEN, MICHEL</au><au>SHULEPOV, SERGEI</au><au>MULKENS, JOHANNES CATHARINUS HUBERTUS</au><au>MA, ZHENHUA</au><au>EVANGELISTA, FABRIZIO</au><au>BESSEMS, DAVID</au><au>EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</au><au>STAVENGA, MARCO KOERT</au><au>WITBERG, ERIK</au><au>CROMWIJK, JAN WILLEM</au><au>KEMPER, NICOLAAS RUDOLF</au><au>GUNTER, PIETER LEIN JOSEPH</au><au>BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS</au><au>JOSEN, MARINUS</au><au>MEIJERS, RALPH JOSEPH</au><au>BELL, FRANCISCUS WILHELMUS</au><au>LEENDERS, MARTINUS HENDRIKUS ANTONIUS</au><au>LIEBREGTS, PAULUS MARTINUS MARIA</au><au>MOERMAN, RICHARD</au><au>SMITS, MARCUS AGNES JOHANNES</au><au>LI, HUA</au><au>STEFFENS, KOEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method</title><date>2014-01-11</date><risdate>2014</risdate><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T15%3A14%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=RIEPEN,%20MICHEL&rft.date=2014-01-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI422988BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |