Ink-jet inks having surfactants below the critical micelle concentration and associated methods
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CORRECTING FLUIDS ; CORRECTION OF TYPOGRAPHICAL ERRORS ; DYES ; FILLING PASTES ; i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME ; INKS ; LINING MACHINES ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PERFORMING OPERATIONS ; POLISHES ; PRINTING ; SELECTIVE PRINTING MECHANISMS ; STAMPS ; TRANSPORTING ; TYPEWRITERS ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130321&DB=EPODOC&CC=TW&NR=I389988B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130321&DB=EPODOC&CC=TW&NR=I389988B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LAUW, HIANG P</creatorcontrib><creatorcontrib>DODGE, TYE</creatorcontrib><title>Ink-jet inks having surfactants below the critical micelle concentration and associated methods</title><subject>ADHESIVES</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>CORRECTING FLUIDS</subject><subject>CORRECTION OF TYPOGRAPHICAL ERRORS</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME</subject><subject>INKS</subject><subject>LINING MACHINES</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>PRINTING</subject><subject>SELECTIVE PRINTING MECHANISMS</subject><subject>STAMPS</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDEOgkAQAGksjPqH_QAVzdFiNNCTWF7Wu0VWjj3Crvp9KXyA1SSTyewL38lUPsmAZVIY8c3yAH2tAwZDMYU7pfwBGwnCysYBE8wcKKVNZAkktqJxFkCJgKo5MBpFmMnGHPVY7AZMSqcfDwVcL_25LWnJnnTB7UDm-1tXubp2rmmqP5IvPlg9mg</recordid><startdate>20130321</startdate><enddate>20130321</enddate><creator>LAUW, HIANG P</creator><creator>DODGE, TYE</creator><scope>EVB</scope></search><sort><creationdate>20130321</creationdate><title>Ink-jet inks having surfactants below the critical micelle concentration and associated methods</title><author>LAUW, HIANG P ; 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subjects | ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS CORRECTION OF TYPOGRAPHICAL ERRORS DYES FILLING PASTES i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME INKS LINING MACHINES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS POLISHES PRINTING SELECTIVE PRINTING MECHANISMS STAMPS TRANSPORTING TYPEWRITERS USE OF MATERIALS THEREFOR WOODSTAINS |
title | Ink-jet inks having surfactants below the critical micelle concentration and associated methods |
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