container_end_page
container_issue
container_start_page
container_title
container_volume
creator WU, TSUNGIN
KOU-YOW TSENG
HONG, TIAN JUE
LIEN, WENNG
CHOU, SHIH LIANG
LIN, TSUNG DE
description
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI307921BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI307921BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI307921BB3</originalsourceid><addsrcrecordid>eNrjZNDxTS3JyE9RyE9TSEktSS3KzczLzEsHsgvyizNLMvPzFEpScwtSixJLSotSeRhY0xJzilN5oTQ3g4Kba4izhy5QdXxqcUFicmpeakl8SLinsYG5pZGhk5MxEUoAf8oqYQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method of determining deposition temperature</title><source>esp@cenet</source><creator>WU, TSUNGIN ; KOU-YOW TSENG ; HONG, TIAN JUE ; LIEN, WENNG ; CHOU, SHIH LIANG ; LIN, TSUNG DE</creator><creatorcontrib>WU, TSUNGIN ; KOU-YOW TSENG ; HONG, TIAN JUE ; LIEN, WENNG ; CHOU, SHIH LIANG ; LIN, TSUNG DE</creatorcontrib><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090321&amp;DB=EPODOC&amp;CC=TW&amp;NR=I307921B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090321&amp;DB=EPODOC&amp;CC=TW&amp;NR=I307921B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WU, TSUNGIN</creatorcontrib><creatorcontrib>KOU-YOW TSENG</creatorcontrib><creatorcontrib>HONG, TIAN JUE</creatorcontrib><creatorcontrib>LIEN, WENNG</creatorcontrib><creatorcontrib>CHOU, SHIH LIANG</creatorcontrib><creatorcontrib>LIN, TSUNG DE</creatorcontrib><title>Method of determining deposition temperature</title><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDxTS3JyE9RyE9TSEktSS3KzczLzEsHsgvyizNLMvPzFEpScwtSixJLSotSeRhY0xJzilN5oTQ3g4Kba4izhy5QdXxqcUFicmpeakl8SLinsYG5pZGhk5MxEUoAf8oqYQ</recordid><startdate>20090321</startdate><enddate>20090321</enddate><creator>WU, TSUNGIN</creator><creator>KOU-YOW TSENG</creator><creator>HONG, TIAN JUE</creator><creator>LIEN, WENNG</creator><creator>CHOU, SHIH LIANG</creator><creator>LIN, TSUNG DE</creator><scope>EVB</scope></search><sort><creationdate>20090321</creationdate><title>Method of determining deposition temperature</title><author>WU, TSUNGIN ; KOU-YOW TSENG ; HONG, TIAN JUE ; LIEN, WENNG ; CHOU, SHIH LIANG ; LIN, TSUNG DE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI307921BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2009</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>WU, TSUNGIN</creatorcontrib><creatorcontrib>KOU-YOW TSENG</creatorcontrib><creatorcontrib>HONG, TIAN JUE</creatorcontrib><creatorcontrib>LIEN, WENNG</creatorcontrib><creatorcontrib>CHOU, SHIH LIANG</creatorcontrib><creatorcontrib>LIN, TSUNG DE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WU, TSUNGIN</au><au>KOU-YOW TSENG</au><au>HONG, TIAN JUE</au><au>LIEN, WENNG</au><au>CHOU, SHIH LIANG</au><au>LIN, TSUNG DE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method of determining deposition temperature</title><date>2009-03-21</date><risdate>2009</risdate><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_TWI307921BB
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Method of determining deposition temperature
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T09%3A25%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WU,%20TSUNGIN&rft.date=2009-03-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI307921BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true