Abnormal photoresist line/space profile detection through signal processing of metrology waveform

A semiconductor manufacturing automation method for analyzing a patterned feature formed on a semiconductor layer is disclosed. At least one patterned feature is scanned to generate an amplitude modulated waveform signal of the line and neighboring space characteristics. Signal processing is automat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MCINTOSH, JOHN MARTIN, VARTULI, CATHERINE, JESSEN, SCOTT, HOUGE, ERIK CHO, STEVIE, FRED ANTHONY
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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