Thin film etching method

A thin film etching method is disclosed, which is used for manufacturing semiconductor device or thin film transistor (TFT) array and through which no undercut may be presented or a good after-etching shape may be achieved with respect to a thin film thus etched. The thin film etching method is perf...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHENG, MIEN-JEN, WU, CHENGANG, SHIH, YEAUNG, CHANG, JUIUNG, HSU, CHIA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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