Substrate processing apparatus

A substrate processing apparatus is capable of providing a comprehensive uniform treatment on a substrate without being current in a situation where the current is stored in a housing container. According to the present invention, while a substrate W is being moved through a roller 15, a plasma gas...

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Bibliographische Detailangaben
1. Verfasser:	YOSHITANI, MITSUAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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