Extreme ultraviolet light source

Extreme ultraviolet light source

The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet...

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Hauptverfasser: OLIVER, ROGER I, NESS, RICHARD M., FOMENKOV, IGOR V, MELNYCHUK, STEPHAN T, PARTLO, WILLIAM N
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRICITY
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creator OLIVER, ROGER I
NESS, RICHARD M.
FOMENKOV, IGOR V
MELNYCHUK, STEPHAN T
PARTLO, WILLIAM N
description The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
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subjects BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRICITY
title Extreme ultraviolet light source
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