Removable reaction chamber liner structure and wafer process reaction chamber containing the same

Removable reaction chamber liner structure and wafer process reaction chamber containing the same

A kind of removable reaction chamber liner structure capable of being disposed on the sidewall of the semiconductor process reaction chamber is provided in the present invention. The reaction chamber liner structure is formed with a hollow cylinder shape and is provided with the upper opening and th...

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Hauptverfasser: CHANG, JUNG-HSIANG, TZENG, HUAN-LIANG
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator CHANG, JUNG-HSIANG
TZENG, HUAN-LIANG
description A kind of removable reaction chamber liner structure capable of being disposed on the sidewall of the semiconductor process reaction chamber is provided in the present invention. The reaction chamber liner structure is formed with a hollow cylinder shape and is provided with the upper opening and the lower opening. The cylinder shape liner structure has a slit for linking the upper and the lower openings so as to elastically deflect the cylinder shape liner structure and shrink its diameter for mounting or removing the liner structure. The cylinder shape liner has a conveying opening that corresponds to the wafer conveying opening position of the process reaction chamber. The upper opening of the removable reaction liner structure can be smaller than the lower opening to have a narrow-top wide-bottom structure for matching with the sidewall of reaction chamber that has a narrow-top wide-bottom design.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Removable reaction chamber liner structure and wafer process reaction chamber containing the same
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