Semiconductor device using a barrier layer between the gate electrode and substrate and method therefor

An enhancement mode semiconductor device has a barrier layer disposed between the gate electrode of the device and the semiconductor substrate underlying the gate electrode. The barrier layer increases the Schottky barrier height of the gate electrode-barrier layer-substrate interface so that the po...

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Hauptverfasser: COSTA, JULIO, MARTINEZ, MARINO J, SCHIRMANN, ERNEST, CODY, NYLES W
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MARTINEZ, MARINO J
SCHIRMANN, ERNEST
CODY, NYLES W
description An enhancement mode semiconductor device has a barrier layer disposed between the gate electrode of the device and the semiconductor substrate underlying the gate electrode. The barrier layer increases the Schottky barrier height of the gate electrode-barrier layer-substrate interface so that the portion of the substrate underlying the gate electrode operates in an enhancement mode. The barrier layer is particularly useful in compound semiconductor field effect transistors, and preferred materials for the barrier layer include aluminum gallium arsenide and indium gallium arsenide.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW525234BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW525234BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW525234BB3</originalsourceid><addsrcrecordid>eNqFijEOgkAQRWksjHoG5wI2IBfAYOwlsSTD7gc2gV0yO6vx9kpib_N-3s_bZsMdszPB22Q0CFk8nQGl6PxATB2LOAhN_P6yg74ATzqCBlYQJhiVYEHsLcXURZX1X22GjsGuraAPss82PU8Rh9_usuO1bi63E5bQIi5s4KFt8yjzMi_OVVX8Lz7YxD-O</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Semiconductor device using a barrier layer between the gate electrode and substrate and method therefor</title><source>esp@cenet</source><creator>COSTA, JULIO ; MARTINEZ, MARINO J ; SCHIRMANN, ERNEST ; CODY, NYLES W</creator><creatorcontrib>COSTA, JULIO ; MARTINEZ, MARINO J ; SCHIRMANN, ERNEST ; CODY, NYLES W</creatorcontrib><description>An enhancement mode semiconductor device has a barrier layer disposed between the gate electrode of the device and the semiconductor substrate underlying the gate electrode. The barrier layer increases the Schottky barrier height of the gate electrode-barrier layer-substrate interface so that the portion of the substrate underlying the gate electrode operates in an enhancement mode. The barrier layer is particularly useful in compound semiconductor field effect transistors, and preferred materials for the barrier layer include aluminum gallium arsenide and indium gallium arsenide.</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20030321&amp;DB=EPODOC&amp;CC=TW&amp;NR=525234B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20030321&amp;DB=EPODOC&amp;CC=TW&amp;NR=525234B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>COSTA, JULIO</creatorcontrib><creatorcontrib>MARTINEZ, MARINO J</creatorcontrib><creatorcontrib>SCHIRMANN, ERNEST</creatorcontrib><creatorcontrib>CODY, NYLES W</creatorcontrib><title>Semiconductor device using a barrier layer between the gate electrode and substrate and method therefor</title><description>An enhancement mode semiconductor device has a barrier layer disposed between the gate electrode of the device and the semiconductor substrate underlying the gate electrode. The barrier layer increases the Schottky barrier height of the gate electrode-barrier layer-substrate interface so that the portion of the substrate underlying the gate electrode operates in an enhancement mode. The barrier layer is particularly useful in compound semiconductor field effect transistors, and preferred materials for the barrier layer include aluminum gallium arsenide and indium gallium arsenide.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqFijEOgkAQRWksjHoG5wI2IBfAYOwlsSTD7gc2gV0yO6vx9kpib_N-3s_bZsMdszPB22Q0CFk8nQGl6PxATB2LOAhN_P6yg74ATzqCBlYQJhiVYEHsLcXURZX1X22GjsGuraAPss82PU8Rh9_usuO1bi63E5bQIi5s4KFt8yjzMi_OVVX8Lz7YxD-O</recordid><startdate>20030321</startdate><enddate>20030321</enddate><creator>COSTA, JULIO</creator><creator>MARTINEZ, MARINO J</creator><creator>SCHIRMANN, ERNEST</creator><creator>CODY, NYLES W</creator><scope>EVB</scope></search><sort><creationdate>20030321</creationdate><title>Semiconductor device using a barrier layer between the gate electrode and substrate and method therefor</title><author>COSTA, JULIO ; MARTINEZ, MARINO J ; SCHIRMANN, ERNEST ; CODY, NYLES W</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW525234BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>COSTA, JULIO</creatorcontrib><creatorcontrib>MARTINEZ, MARINO J</creatorcontrib><creatorcontrib>SCHIRMANN, ERNEST</creatorcontrib><creatorcontrib>CODY, NYLES W</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>COSTA, JULIO</au><au>MARTINEZ, MARINO J</au><au>SCHIRMANN, ERNEST</au><au>CODY, NYLES W</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semiconductor device using a barrier layer between the gate electrode and substrate and method therefor</title><date>2003-03-21</date><risdate>2003</risdate><abstract>An enhancement mode semiconductor device has a barrier layer disposed between the gate electrode of the device and the semiconductor substrate underlying the gate electrode. The barrier layer increases the Schottky barrier height of the gate electrode-barrier layer-substrate interface so that the portion of the substrate underlying the gate electrode operates in an enhancement mode. The barrier layer is particularly useful in compound semiconductor field effect transistors, and preferred materials for the barrier layer include aluminum gallium arsenide and indium gallium arsenide.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Semiconductor device using a barrier layer between the gate electrode and substrate and method therefor
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T14%3A55%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=COSTA,%20JULIO&rft.date=2003-03-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW525234BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true