Monitor method of chemical vapor deposition process temperature

This invention provides a monitor method of chemical vapor deposition process temperature, which utilizes sub-atmospheric undoped silicate glass (SAUSG) as a temperature index. According to the invented method, a SAUSU film is formed onto a blanket wafer, comparison among deposition rate, standard d...

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Bibliographische Detailangaben

Hauptverfasser:	YANG, JENG-LUNG, HUNG, MENGI, WU, BING-HUAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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