Monitor system and method for semiconductor process

A monitor system and method for characterizing semiconductor processes including ion implantation processes is provided. The system includes a test wafer which has a plurality of sensors formed on its surface. The test wafer may be loaded into the process chamber of a process system and exposed, for...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MACINTOSH, EDWARD, RADOVANOV, SVETLANA B, AYERS, GARY, COREY, PHILIP
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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