Method of etching, as well as frame element, mask and prefabricated substrate element for use in such etching

In a method of etching a substrate (1) having a surface layer (3) of conductive material, a circuit pattern is transferred to the surface layer (3) in a central surface area portion (4) of the substrate (1) by electrochemical etching. To prevent excessive current densities from forming at the periph...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SJOBERG, JENNY, XIE, BIN, PETERSSON, PER, GUSTAVSSON, MIKAEL, BJARNASON, BJARNI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY PRINTED CIRCUITS PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
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