Apparatus for detecting plasma anomalous discharge and method of detecting the same
The present invention relates to an apparatus for detecting plasma anomalous discharge and method of detecting the same, and the supporting housing of acoustic wave emission detector. The essential point is that the plasma generating chamber of the plasma processing apparatus is constituted of a mul...
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| creator | YASAKA, MITSUO TAKESHITA, MASAYOSHI |
| description | The present invention relates to an apparatus for detecting plasma anomalous discharge and method of detecting the same, and the supporting housing of acoustic wave emission detector. The essential point is that the plasma generating chamber of the plasma processing apparatus is constituted of a multiplicity of ultrasonic detectors such that ultrasonic wave accompanying an anomalous discharge is detected by the ultrasonic detectors. The output of each detector is compared with each other on the same time axis to obtain the maximum range of amplitudes and the differences in delay time of the respective ultrasonic detectors. The position and the generation of the anomalous discharge of the specific plasma processing are determined based on those mentioned above, which can be displayed on a monitor and utilized to issue an alarm if necessary. By properly and correctly detecting the generated anomalous plasma discharge, and the position, the magnitude of energy in the plasma processing to stop the operation of the plasma processing device, the manufacturing of (mixed) defect product can be prevented. An AE (Acoustic wave emission) sensor hold case is disposed at the specified position of the lower cover, and an upper cover which has a flexible member in its upper and inner side, which pushes the AE sensor against the contact surface of the coupling agent of lower cover with an adequate pressure to press the supporting housing to be adhered to the plasma processing chamber. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW505939BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW505939BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW505939BB3</originalsourceid><addsrcrecordid>eNrjZAh2LChILEosKS1WSMsvUkhJLUlNLsnMS1coyEkszk1USMzLz03MyQdKp2QWJ2ckFqWnAsVSFHJTSzLyUxTy05C0lGSkKhQn5qbyMLCmJeYUp_JCaW4GeTfXEGcP3dSC_PjU4oLE5NS81JL4kHBTA1NLY0snJ2PCKgCSwDf7</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus for detecting plasma anomalous discharge and method of detecting the same</title><source>esp@cenet</source><creator>YASAKA, MITSUO ; TAKESHITA, MASAYOSHI</creator><creatorcontrib>YASAKA, MITSUO ; TAKESHITA, MASAYOSHI</creatorcontrib><description>The present invention relates to an apparatus for detecting plasma anomalous discharge and method of detecting the same, and the supporting housing of acoustic wave emission detector. The essential point is that the plasma generating chamber of the plasma processing apparatus is constituted of a multiplicity of ultrasonic detectors such that ultrasonic wave accompanying an anomalous discharge is detected by the ultrasonic detectors. The output of each detector is compared with each other on the same time axis to obtain the maximum range of amplitudes and the differences in delay time of the respective ultrasonic detectors. The position and the generation of the anomalous discharge of the specific plasma processing are determined based on those mentioned above, which can be displayed on a monitor and utilized to issue an alarm if necessary. By properly and correctly detecting the generated anomalous plasma discharge, and the position, the magnitude of energy in the plasma processing to stop the operation of the plasma processing device, the manufacturing of (mixed) defect product can be prevented. An AE (Acoustic wave emission) sensor hold case is disposed at the specified position of the lower cover, and an upper cover which has a flexible member in its upper and inner side, which pushes the AE sensor against the contact surface of the coupling agent of lower cover with an adequate pressure to press the supporting housing to be adhered to the plasma processing chamber.</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC ORINFRASONIC WAVES ; MEASURING ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PHYSICS ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; TESTING ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20021011&DB=EPODOC&CC=TW&NR=505939B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20021011&DB=EPODOC&CC=TW&NR=505939B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YASAKA, MITSUO</creatorcontrib><creatorcontrib>TAKESHITA, MASAYOSHI</creatorcontrib><title>Apparatus for detecting plasma anomalous discharge and method of detecting the same</title><description>The present invention relates to an apparatus for detecting plasma anomalous discharge and method of detecting the same, and the supporting housing of acoustic wave emission detector. The essential point is that the plasma generating chamber of the plasma processing apparatus is constituted of a multiplicity of ultrasonic detectors such that ultrasonic wave accompanying an anomalous discharge is detected by the ultrasonic detectors. The output of each detector is compared with each other on the same time axis to obtain the maximum range of amplitudes and the differences in delay time of the respective ultrasonic detectors. The position and the generation of the anomalous discharge of the specific plasma processing are determined based on those mentioned above, which can be displayed on a monitor and utilized to issue an alarm if necessary. By properly and correctly detecting the generated anomalous plasma discharge, and the position, the magnitude of energy in the plasma processing to stop the operation of the plasma processing device, the manufacturing of (mixed) defect product can be prevented. An AE (Acoustic wave emission) sensor hold case is disposed at the specified position of the lower cover, and an upper cover which has a flexible member in its upper and inner side, which pushes the AE sensor against the contact surface of the coupling agent of lower cover with an adequate pressure to press the supporting housing to be adhered to the plasma processing chamber.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC ORINFRASONIC WAVES</subject><subject>MEASURING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PHYSICS</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>TESTING</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAh2LChILEosKS1WSMsvUkhJLUlNLsnMS1coyEkszk1USMzLz03MyQdKp2QWJ2ckFqWnAsVSFHJTSzLyUxTy05C0lGSkKhQn5qbyMLCmJeYUp_JCaW4GeTfXEGcP3dSC_PjU4oLE5NS81JL4kHBTA1NLY0snJ2PCKgCSwDf7</recordid><startdate>20021011</startdate><enddate>20021011</enddate><creator>YASAKA, MITSUO</creator><creator>TAKESHITA, MASAYOSHI</creator><scope>EVB</scope></search><sort><creationdate>20021011</creationdate><title>Apparatus for detecting plasma anomalous discharge and method of detecting the same</title><author>YASAKA, MITSUO ; TAKESHITA, MASAYOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW505939BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC ORINFRASONIC WAVES</topic><topic>MEASURING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PHYSICS</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>TESTING</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YASAKA, MITSUO</creatorcontrib><creatorcontrib>TAKESHITA, MASAYOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YASAKA, MITSUO</au><au>TAKESHITA, MASAYOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus for detecting plasma anomalous discharge and method of detecting the same</title><date>2002-10-11</date><risdate>2002</risdate><abstract>The present invention relates to an apparatus for detecting plasma anomalous discharge and method of detecting the same, and the supporting housing of acoustic wave emission detector. The essential point is that the plasma generating chamber of the plasma processing apparatus is constituted of a multiplicity of ultrasonic detectors such that ultrasonic wave accompanying an anomalous discharge is detected by the ultrasonic detectors. The output of each detector is compared with each other on the same time axis to obtain the maximum range of amplitudes and the differences in delay time of the respective ultrasonic detectors. The position and the generation of the anomalous discharge of the specific plasma processing are determined based on those mentioned above, which can be displayed on a monitor and utilized to issue an alarm if necessary. By properly and correctly detecting the generated anomalous plasma discharge, and the position, the magnitude of energy in the plasma processing to stop the operation of the plasma processing device, the manufacturing of (mixed) defect product can be prevented. An AE (Acoustic wave emission) sensor hold case is disposed at the specified position of the lower cover, and an upper cover which has a flexible member in its upper and inner side, which pushes the AE sensor against the contact surface of the coupling agent of lower cover with an adequate pressure to press the supporting housing to be adhered to the plasma processing chamber.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC ORINFRASONIC WAVES MEASURING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS TESTING THEIR RELEVANT APPARATUS TRANSPORTING |
| title | Apparatus for detecting plasma anomalous discharge and method of detecting the same |
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