Method to accurately control the manufacturing of high performance photodiode

The present invention provides a method to accurately control the manufacturing of high performance photodiode, which comprises providing a substrate; form a hard mask layer with a specific pattern on this substrate; etch this substrate without being covered by this hard mask layer, and form a shall...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TSENG, CHIEN-HSIEN, WUU, SHOU-GWO, YANG, DUN-NIAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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