A method of sterilizing a ultrapure water delivery system in the semiconductor device fabrication process

There are provided a sterilizing composition comprising the mixture of hydrogen peroxide, peracetic acid and deionized water, a method of sterilizing a ultrapure water delivery system using the sterilizing composition and hot water, and a ultrapure water delivery system which is sterilized using the...

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Hauptverfasser: HWANG, JUNG-SUNG, KIM, SUE-RYEON, KIM, SEUNG-UHN, OH, YUNUL
Format: Patent
Sprache:eng
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Zusammenfassung:There are provided a sterilizing composition comprising the mixture of hydrogen peroxide, peracetic acid and deionized water, a method of sterilizing a ultrapure water delivery system using the sterilizing composition and hot water, and a ultrapure water delivery system which is sterilized using the sterilizing composition and hot water for usage of semiconductor device fabrication process. The method of sterilizing the ultrapure water delivery system comprises the steps of sterilizing OR-Polisher and MB-Polisher in the ultrapure water delivery system comprising a pure water tank, a heat exchanger, Ultraviolet-sterilizer, OR-Polisher and MB-Polisher, and a ultrafilter, etc. by supplying hot water (hot water sterilization step), and sterilizing the pure water tank, the heat exchanger, Ultraviolet-sterilizer, and the ultrafilter, etc. of the ultrapure water delivery system by circulating the deionized water including a sterilizer (sterilizer sterilization step).