Method of focus measurement

The present invention provides a method of focus measurement, wherein a specially designed mask pattern is used to measure the best focus of the exposure process, which is a binary mask layout of bar-like pattern built with BIB patterns including both inner and outside rectangles. When the focused p...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHENG, YUNGUNG, KU, CHIN-YU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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