Stable inorganic polymers

Processes for producing poly (hydrido siloxane) copolymers and processes for producing solutions of such copolymers for coating semiconductor substrates are provided. The copolymers have the general formula: (HSiO1.5)a(HSiO(OR))b(SiO2)c, wherein R is a mixture of H and an alky1 group having between...

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Bibliographische Detailangaben
Hauptverfasser: NAKANO, TADASHI, LEUNG, ROGER Y
Format: Patent
Sprache:eng
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Zusammenfassung:Processes for producing poly (hydrido siloxane) copolymers and processes for producing solutions of such copolymers for coating semiconductor substrates are provided. The copolymers have the general formula: (HSiO1.5)a(HSiO(OR))b(SiO2)c, wherein R is a mixture of H and an alky1 group having between 1 and 4 carbon atoms; a+b+c=1; 0.5