Optimal determination of an overlay target using machine learning

There are provided systems and methods comprising, for each given overlay target of a plurality of different overlay targets to be manufactured on a semiconductor specimen, said given overlay target comprising a plurality of stacked semiconductor layers, obtaining a design image of the given overlay...

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Bibliographische Detailangaben

Hauptverfasser:	YACOBY, RAN, DUBOVSKI, BAR, LEVANT, BORIS, HSIEH, TUNG-YUAN, HOUCHENS, KEVIN RYAN, BOMSHTEIN, NAHUM, ITZKOVICH, TAL, PERRY, JENNY
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS
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