Progressively energized electrostatic clamp for a lithography apparatus
An electrostatic clamp is described. The electrostatic clamp comprises a surface configured to contact a clamped object and an electrode coupled to the surface. The electrode is configured to progressively energize portions of the surface such that contact between the object and the surface propagat...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KRISHNAN, HARI UITTERDIJK, TAMMO MUROSKI, ALLEN RICHARD VERGEER, KURT HEIN |
| description | An electrostatic clamp is described. The electrostatic clamp comprises a surface configured to contact a clamped object and an electrode coupled to the surface. The electrode is configured to progressively energize portions of the surface such that contact between the object and the surface propagates from an initially energized contact location progressively across the surface. Contact between the object and the surface propagates from the initially energized contact location at a rate that facilitates local stress relaxation in the object as contact occurs progressively across the surface. A rate of surface energization is slower than a rate of local stress relaxation in the object, for example. This contrasts with a typical clamp where a near instant uniform applied voltage over the whole electrode area causes a bowed reticle to be clamped over a large area without having the time to "relax", causing local stress that cannot be easily removed. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202434995A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202434995A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202434995A3</originalsourceid><addsrcrecordid>eNrjZHAPKMpPL0otLs4sS82pVEjNSy1Kz6xKTVFIzUlNLinKLy5JLMlMVkjOScwtUEjLL1JIVMjJLMkA6kksyKhUSCwoSCxKLCkt5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFiclAo0viQ8KNDIxMjE0sLU0djYlRAwD0_DUw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Progressively energized electrostatic clamp for a lithography apparatus</title><source>esp@cenet</source><creator>KRISHNAN, HARI ; UITTERDIJK, TAMMO ; MUROSKI, ALLEN RICHARD ; VERGEER, KURT HEIN</creator><creatorcontrib>KRISHNAN, HARI ; UITTERDIJK, TAMMO ; MUROSKI, ALLEN RICHARD ; VERGEER, KURT HEIN</creatorcontrib><description>An electrostatic clamp is described. The electrostatic clamp comprises a surface configured to contact a clamped object and an electrode coupled to the surface. The electrode is configured to progressively energize portions of the surface such that contact between the object and the surface propagates from an initially energized contact location progressively across the surface. Contact between the object and the surface propagates from the initially energized contact location at a rate that facilitates local stress relaxation in the object as contact occurs progressively across the surface. A rate of surface energization is slower than a rate of local stress relaxation in the object, for example. This contrasts with a typical clamp where a near instant uniform applied voltage over the whole electrode area causes a bowed reticle to be clamped over a large area without having the time to "relax", causing local stress that cannot be easily removed.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240901&DB=EPODOC&CC=TW&NR=202434995A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240901&DB=EPODOC&CC=TW&NR=202434995A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KRISHNAN, HARI</creatorcontrib><creatorcontrib>UITTERDIJK, TAMMO</creatorcontrib><creatorcontrib>MUROSKI, ALLEN RICHARD</creatorcontrib><creatorcontrib>VERGEER, KURT HEIN</creatorcontrib><title>Progressively energized electrostatic clamp for a lithography apparatus</title><description>An electrostatic clamp is described. The electrostatic clamp comprises a surface configured to contact a clamped object and an electrode coupled to the surface. The electrode is configured to progressively energize portions of the surface such that contact between the object and the surface propagates from an initially energized contact location progressively across the surface. Contact between the object and the surface propagates from the initially energized contact location at a rate that facilitates local stress relaxation in the object as contact occurs progressively across the surface. A rate of surface energization is slower than a rate of local stress relaxation in the object, for example. This contrasts with a typical clamp where a near instant uniform applied voltage over the whole electrode area causes a bowed reticle to be clamped over a large area without having the time to "relax", causing local stress that cannot be easily removed.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAPKMpPL0otLs4sS82pVEjNSy1Kz6xKTVFIzUlNLinKLy5JLMlMVkjOScwtUEjLL1JIVMjJLMkA6kksyKhUSCwoSCxKLCkt5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFiclAo0viQ8KNDIxMjE0sLU0djYlRAwD0_DUw</recordid><startdate>20240901</startdate><enddate>20240901</enddate><creator>KRISHNAN, HARI</creator><creator>UITTERDIJK, TAMMO</creator><creator>MUROSKI, ALLEN RICHARD</creator><creator>VERGEER, KURT HEIN</creator><scope>EVB</scope></search><sort><creationdate>20240901</creationdate><title>Progressively energized electrostatic clamp for a lithography apparatus</title><author>KRISHNAN, HARI ; UITTERDIJK, TAMMO ; MUROSKI, ALLEN RICHARD ; VERGEER, KURT HEIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202434995A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KRISHNAN, HARI</creatorcontrib><creatorcontrib>UITTERDIJK, TAMMO</creatorcontrib><creatorcontrib>MUROSKI, ALLEN RICHARD</creatorcontrib><creatorcontrib>VERGEER, KURT HEIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KRISHNAN, HARI</au><au>UITTERDIJK, TAMMO</au><au>MUROSKI, ALLEN RICHARD</au><au>VERGEER, KURT HEIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Progressively energized electrostatic clamp for a lithography apparatus</title><date>2024-09-01</date><risdate>2024</risdate><abstract>An electrostatic clamp is described. The electrostatic clamp comprises a surface configured to contact a clamped object and an electrode coupled to the surface. The electrode is configured to progressively energize portions of the surface such that contact between the object and the surface propagates from an initially energized contact location progressively across the surface. Contact between the object and the surface propagates from the initially energized contact location at a rate that facilitates local stress relaxation in the object as contact occurs progressively across the surface. A rate of surface energization is slower than a rate of local stress relaxation in the object, for example. This contrasts with a typical clamp where a near instant uniform applied voltage over the whole electrode area causes a bowed reticle to be clamped over a large area without having the time to "relax", causing local stress that cannot be easily removed.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW202434995A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Progressively energized electrostatic clamp for a lithography apparatus |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-18T07%3A37%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KRISHNAN,%20HARI&rft.date=2024-09-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW202434995A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |