System for mounting and heating a workpiece

A workpiece mounting system comprising a chuck and a base is disclosed. The emissivity of the base is increased to allow more heat transfer from the chuck to the base. In some embodiments, the emissivity of the base may be controllable so that for ion beams with lower power levels, the emissivity re...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SUN, DAWEI, HERMANSON, ERIC D, HENEVELD, BENJAMIN E
Format: Patent
Sprache:chi ; eng
Schlagworte:
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