Mirror socket, optical system and projection exposure apparatus
A mirror socket (112, 112A, 112B, 112C, 112D, 112E, 112F, 112G, 112H, 112I, 112J, 112K, 112L, 112M, 112N, 112O, 114, 116) for an optical element (102, 102'), comprising a centre axis (126), a first spatial direction (x) oriented perpendicular to the centre axis (126) and a second spatial direct...
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| creator | ORLIK, ROMAN NEFZI, MARWENE RIEF, KLAUS KRUIS, JOHANNES PAETZ, DANIEL GARATIDOU, ANASTASIA |
| description | A mirror socket (112, 112A, 112B, 112C, 112D, 112E, 112F, 112G, 112H, 112I, 112J, 112K, 112L, 112M, 112N, 112O, 114, 116) for an optical element (102, 102'), comprising a centre axis (126), a first spatial direction (x) oriented perpendicular to the centre axis (126) and a second spatial direction (y) oriented perpendicular to the centre axis (126) and perpendicular to the first spatial direction (x), wherein the mirror socket (112, 112A, 112B, 112C, 112D, 112E, 112F, 112G, 112H, 112I, 112J, 112K, 112L, 112M, 112N, 112O, 114, 116) has a first stiffness viewed in the first spatial direction (x) and a second stiffness viewed in the second spatial direction (y) and wherein the first stiffness and the second stiffness have different magnitudes. |
| format | Patent |
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eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240616&DB=EPODOC&CC=TW&NR=202424568A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240616&DB=EPODOC&CC=TW&NR=202424568A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ORLIK, ROMAN</creatorcontrib><creatorcontrib>NEFZI, MARWENE</creatorcontrib><creatorcontrib>RIEF, KLAUS</creatorcontrib><creatorcontrib>KRUIS, JOHANNES</creatorcontrib><creatorcontrib>PAETZ, DANIEL</creatorcontrib><creatorcontrib>GARATIDOU, ANASTASIA</creatorcontrib><title>Mirror socket, optical system and projection exposure apparatus</title><description>A mirror socket (112, 112A, 112B, 112C, 112D, 112E, 112F, 112G, 112H, 112I, 112J, 112K, 112L, 112M, 112N, 112O, 114, 116) for an optical element (102, 102'), comprising a centre axis (126), a first spatial direction (x) oriented perpendicular to the centre axis (126) and a second spatial direction (y) oriented perpendicular to the centre axis (126) and perpendicular to the first spatial direction (x), wherein the mirror socket (112, 112A, 112B, 112C, 112D, 112E, 112F, 112G, 112H, 112I, 112J, 112K, 112L, 112M, 112N, 112O, 114, 116) has a first stiffness viewed in the first spatial direction (x) and a second stiffness viewed in the second spatial direction (y) and wherein the first stiffness and the second stiffness have different magnitudes.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD3zSwqyi9SKM5Pzk4t0VHILyjJTE7MUSiuLC5JzVVIzEtRKCjKz0pNLsnMz1NIrSjILy4tSlVILChILEosKS3mYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxIeFGBkYmRiamZhaOxsSoAQDTvDG5</recordid><startdate>20240616</startdate><enddate>20240616</enddate><creator>ORLIK, ROMAN</creator><creator>NEFZI, MARWENE</creator><creator>RIEF, KLAUS</creator><creator>KRUIS, JOHANNES</creator><creator>PAETZ, DANIEL</creator><creator>GARATIDOU, ANASTASIA</creator><scope>EVB</scope></search><sort><creationdate>20240616</creationdate><title>Mirror socket, optical system and projection exposure apparatus</title><author>ORLIK, ROMAN ; NEFZI, MARWENE ; RIEF, KLAUS ; KRUIS, JOHANNES ; PAETZ, DANIEL ; GARATIDOU, ANASTASIA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202424568A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ORLIK, ROMAN</creatorcontrib><creatorcontrib>NEFZI, MARWENE</creatorcontrib><creatorcontrib>RIEF, KLAUS</creatorcontrib><creatorcontrib>KRUIS, JOHANNES</creatorcontrib><creatorcontrib>PAETZ, DANIEL</creatorcontrib><creatorcontrib>GARATIDOU, ANASTASIA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ORLIK, ROMAN</au><au>NEFZI, MARWENE</au><au>RIEF, KLAUS</au><au>KRUIS, JOHANNES</au><au>PAETZ, DANIEL</au><au>GARATIDOU, ANASTASIA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Mirror socket, optical system and projection exposure apparatus</title><date>2024-06-16</date><risdate>2024</risdate><abstract>A mirror socket (112, 112A, 112B, 112C, 112D, 112E, 112F, 112G, 112H, 112I, 112J, 112K, 112L, 112M, 112N, 112O, 114, 116) for an optical element (102, 102'), comprising a centre axis (126), a first spatial direction (x) oriented perpendicular to the centre axis (126) and a second spatial direction (y) oriented perpendicular to the centre axis (126) and perpendicular to the first spatial direction (x), wherein the mirror socket (112, 112A, 112B, 112C, 112D, 112E, 112F, 112G, 112H, 112I, 112J, 112K, 112L, 112M, 112N, 112O, 114, 116) has a first stiffness viewed in the first spatial direction (x) and a second stiffness viewed in the second spatial direction (y) and wherein the first stiffness and the second stiffness have different magnitudes.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW202424568A |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Mirror socket, optical system and projection exposure apparatus |
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