Semiconductor measurement apparatus
A semiconductor measurement apparatus includes an illuminator configured to output light having a first wavelength band and light having a second wavelength band, different from the first wavelength band, a stage on which a test object is positioned, a camera configured to receive light reflected or...
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creator | AHN, JIN-WOO HWANG, EUN-SOO LEE, JAE-WON LEE, DONG-GUN OH, JUN-TAEK |
description | A semiconductor measurement apparatus includes an illuminator configured to output light having a first wavelength band and light having a second wavelength band, different from the first wavelength band, a stage on which a test object is positioned, a camera configured to receive light reflected or scattered from the test object or transmitted through the test object, and a controller configured to control the illuminator and the camera, and to measure, based on information indicated by the light received by the camera, a plurality of structures included in the test object. The controller is configured to set an exposure time of the camera to a first exposure time while the illuminator outputs the light having the first wavelength band, and to set the exposure time of the camera to a second exposure time, different from the first exposure time, while the illuminator outputs the light having the second wavelength band. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202417810A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202417810A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202417810A3</originalsourceid><addsrcrecordid>eNrjZFAOTs3NTM7PSylNLskvUshNTSwuLUrNTc0rUUgsKEgsSiwpLeZhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfEh4UYGRiaG5haGBo7GxKgBADFXJ0Y</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Semiconductor measurement apparatus</title><source>esp@cenet</source><creator>AHN, JIN-WOO ; HWANG, EUN-SOO ; LEE, JAE-WON ; LEE, DONG-GUN ; OH, JUN-TAEK</creator><creatorcontrib>AHN, JIN-WOO ; HWANG, EUN-SOO ; LEE, JAE-WON ; LEE, DONG-GUN ; OH, JUN-TAEK</creatorcontrib><description>A semiconductor measurement apparatus includes an illuminator configured to output light having a first wavelength band and light having a second wavelength band, different from the first wavelength band, a stage on which a test object is positioned, a camera configured to receive light reflected or scattered from the test object or transmitted through the test object, and a controller configured to control the illuminator and the camera, and to measure, based on information indicated by the light received by the camera, a plurality of structures included in the test object. The controller is configured to set an exposure time of the camera to a first exposure time while the illuminator outputs the light having the first wavelength band, and to set the exposure time of the camera to a second exposure time, different from the first exposure time, while the illuminator outputs the light having the second wavelength band.</description><language>chi ; eng</language><subject>MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; TESTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240501&DB=EPODOC&CC=TW&NR=202417810A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240501&DB=EPODOC&CC=TW&NR=202417810A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>AHN, JIN-WOO</creatorcontrib><creatorcontrib>HWANG, EUN-SOO</creatorcontrib><creatorcontrib>LEE, JAE-WON</creatorcontrib><creatorcontrib>LEE, DONG-GUN</creatorcontrib><creatorcontrib>OH, JUN-TAEK</creatorcontrib><title>Semiconductor measurement apparatus</title><description>A semiconductor measurement apparatus includes an illuminator configured to output light having a first wavelength band and light having a second wavelength band, different from the first wavelength band, a stage on which a test object is positioned, a camera configured to receive light reflected or scattered from the test object or transmitted through the test object, and a controller configured to control the illuminator and the camera, and to measure, based on information indicated by the light received by the camera, a plurality of structures included in the test object. The controller is configured to set an exposure time of the camera to a first exposure time while the illuminator outputs the light having the first wavelength band, and to set the exposure time of the camera to a second exposure time, different from the first exposure time, while the illuminator outputs the light having the second wavelength band.</description><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAOTs3NTM7PSylNLskvUshNTSwuLUrNTc0rUUgsKEgsSiwpLeZhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfEh4UYGRiaG5haGBo7GxKgBADFXJ0Y</recordid><startdate>20240501</startdate><enddate>20240501</enddate><creator>AHN, JIN-WOO</creator><creator>HWANG, EUN-SOO</creator><creator>LEE, JAE-WON</creator><creator>LEE, DONG-GUN</creator><creator>OH, JUN-TAEK</creator><scope>EVB</scope></search><sort><creationdate>20240501</creationdate><title>Semiconductor measurement apparatus</title><author>AHN, JIN-WOO ; HWANG, EUN-SOO ; LEE, JAE-WON ; LEE, DONG-GUN ; OH, JUN-TAEK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202417810A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>AHN, JIN-WOO</creatorcontrib><creatorcontrib>HWANG, EUN-SOO</creatorcontrib><creatorcontrib>LEE, JAE-WON</creatorcontrib><creatorcontrib>LEE, DONG-GUN</creatorcontrib><creatorcontrib>OH, JUN-TAEK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>AHN, JIN-WOO</au><au>HWANG, EUN-SOO</au><au>LEE, JAE-WON</au><au>LEE, DONG-GUN</au><au>OH, JUN-TAEK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semiconductor measurement apparatus</title><date>2024-05-01</date><risdate>2024</risdate><abstract>A semiconductor measurement apparatus includes an illuminator configured to output light having a first wavelength band and light having a second wavelength band, different from the first wavelength band, a stage on which a test object is positioned, a camera configured to receive light reflected or scattered from the test object or transmitted through the test object, and a controller configured to control the illuminator and the camera, and to measure, based on information indicated by the light received by the camera, a plurality of structures included in the test object. The controller is configured to set an exposure time of the camera to a first exposure time while the illuminator outputs the light having the first wavelength band, and to set the exposure time of the camera to a second exposure time, different from the first exposure time, while the illuminator outputs the light having the second wavelength band.</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
recordid | cdi_epo_espacenet_TW202417810A |
source | esp@cenet |
subjects | MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
title | Semiconductor measurement apparatus |
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