Deposition mask for OLED pixel deposition
A deposition mask comprising; a metal plate including a deposition region and a non-deposition region, wherein the deposition region includes at least one effective portion; wherein the effective portion includes a plurality of unit through-holes, wherein the unit through-holes include a small surfa...
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creator | LEE, SEUNG-HEON UM, TAE-IN |
description | A deposition mask comprising; a metal plate including a deposition region and a non-deposition region, wherein the deposition region includes at least one effective portion; wherein the effective portion includes a plurality of unit through-holes, wherein the unit through-holes include a small surface hole formed on a first surface of the metal plate; a large surface hole formed on a second surface of the metal plate; and a connecting portion connecting the small surface hole and the large surface hole, wherein a rib is disposed between unit through-holes adjacent in the first direction, wherein an island portion is disposed between the unit through-holes adjacent in the second direction, wherein the island portion includes a first island portion and a second island portion spaced apart from each other, wherein the first island portion contacts the rib, wherein the second island portion is spaced apart from the rib. |
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a large surface hole formed on a second surface of the metal plate; and a connecting portion connecting the small surface hole and the large surface hole, wherein a rib is disposed between unit through-holes adjacent in the first direction, wherein an island portion is disposed between the unit through-holes adjacent in the second direction, wherein the island portion includes a first island portion and a second island portion spaced apart from each other, wherein the first island portion contacts the rib, wherein the second island portion is spaced apart from the rib.</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240301&DB=EPODOC&CC=TW&NR=202410510A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240301&DB=EPODOC&CC=TW&NR=202410510A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE, SEUNG-HEON</creatorcontrib><creatorcontrib>UM, TAE-IN</creatorcontrib><title>Deposition mask for OLED pixel deposition</title><description>A deposition mask comprising; a metal plate including a deposition region and a non-deposition region, wherein the deposition region includes at least one effective portion; wherein the effective portion includes a plurality of unit through-holes, wherein the unit through-holes include a small surface hole formed on a first surface of the metal plate; a large surface hole formed on a second surface of the metal plate; and a connecting portion connecting the small surface hole and the large surface hole, wherein a rib is disposed between unit through-holes adjacent in the first direction, wherein an island portion is disposed between the unit through-holes adjacent in the second direction, wherein the island portion includes a first island portion and a second island portion spaced apart from each other, wherein the first island portion contacts the rib, wherein the second island portion is spaced apart from the rib.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB0SS3IL84syczPU8hNLM5WSMsvUvD3cXVRKMisSM1RSIFL8zCwpiXmFKfyQmluBkU31xBnD12givjU4oLE5NS81JL4kHAjAyMTQwNTQwNHY2LUAADXDChX</recordid><startdate>20240301</startdate><enddate>20240301</enddate><creator>LEE, SEUNG-HEON</creator><creator>UM, TAE-IN</creator><scope>EVB</scope></search><sort><creationdate>20240301</creationdate><title>Deposition mask for OLED pixel deposition</title><author>LEE, SEUNG-HEON ; UM, TAE-IN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202410510A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE, SEUNG-HEON</creatorcontrib><creatorcontrib>UM, TAE-IN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE, SEUNG-HEON</au><au>UM, TAE-IN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Deposition mask for OLED pixel deposition</title><date>2024-03-01</date><risdate>2024</risdate><abstract>A deposition mask comprising; a metal plate including a deposition region and a non-deposition region, wherein the deposition region includes at least one effective portion; wherein the effective portion includes a plurality of unit through-holes, wherein the unit through-holes include a small surface hole formed on a first surface of the metal plate; a large surface hole formed on a second surface of the metal plate; and a connecting portion connecting the small surface hole and the large surface hole, wherein a rib is disposed between unit through-holes adjacent in the first direction, wherein an island portion is disposed between the unit through-holes adjacent in the second direction, wherein the island portion includes a first island portion and a second island portion spaced apart from each other, wherein the first island portion contacts the rib, wherein the second island portion is spaced apart from the rib.</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
recordid | cdi_epo_espacenet_TW202410510A |
source | esp@cenet |
subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Deposition mask for OLED pixel deposition |
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