Integrated circuit device
An integrated circuit device includes a substrate having a plurality of active regions defined therein, a first word line structure including a first word line, a first gate dielectric film surrounding the first word line, and an oxide semiconductor channel layer surrounding the first gate dielectri...
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| Hauptverfasser: | , , , , , |
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| Format: | Patent |
| Sprache: | chi ; eng |
| Online-Zugang: | Volltext bestellen |
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