Shared RPS clean and bypass delivery architecture

Exemplary substrate processing systems may include a lid plate. The systems may include a gas feed line having an RPS outlet and a bypass outlet. The systems may include a remote plasma unit supported atop the lid plate. The remote plasma unit may include an inlet and an outlet. The inlet may be cou...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHAKRAVARTHY, ARUN CHAKRAVARTHY, RAMAMURTHI, BADRI N, SRICHURNAM, DHARMA RATNAM, PRABHAKAR, VINAY K, KANGUDE, ABHIJIT A
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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