Gas-pulsing-based shared precursor distribution system and methods of use

Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared...

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Bibliographische Detailangaben

Hauptverfasser:	AUBUCHON, JOSEPH, JOSEPHSON, MARCEL E, RICE, MICHAEL, KOSHTI, SUSHANT SURESH, LE, KENNETH, XU, MING, FERNANDEZ, ALEXANDER, OKADA, ASHLEY M, BRASHEAR, KEVIN M, BALUJA, SANJEEV
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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