Methods for measuring at least one target on a substrate and associated apparatuses and substrate

Disclosed is a method of determining a correction for a measurement of at least one target on a substrate, the target comprising one or more parameter of interest sensitive sub-targets which are each sensitive to a parameter of interest and one or more parameter of interest insensitive sub-targets w...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YUEH, CHENG-TENG, GARCIA GRANDA, MIGUEL, JACOBS, JORT ADRIANUS THOMAS, VAN DEN BOS, KAREL HENDRIK WOUTER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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